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Ultrathin EOT scaling of high-k/metal gate stacks

dc.contributor.authorRagnarsson, Lars-Ake
dc.contributor.authorCho, Moon Ju
dc.contributor.authorChiarella, Thomas
dc.contributor.authorMitard, Jerome
dc.contributor.authorSchram, Tom
dc.contributor.authorRohr, Erika
dc.contributor.authorWitters, Liesbeth
dc.contributor.authorTogo, Mitsuhiro
dc.contributor.authorHoriguchi, Naoto
dc.contributor.authorThean, Aaron
dc.date.accessioned2021-10-19T17:51:41Z
dc.date.available2021-10-19T17:51:41Z
dc.date.issued2011
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/19650
dc.sourceIIOimport
dc.titleUltrathin EOT scaling of high-k/metal gate stacks
dc.typeProceedings paper
dc.contributor.imecauthorRagnarsson, Lars-Ake
dc.contributor.imecauthorChiarella, Thomas
dc.contributor.imecauthorMitard, Jerome
dc.contributor.imecauthorSchram, Tom
dc.contributor.imecauthorWitters, Liesbeth
dc.contributor.imecauthorHoriguchi, Naoto
dc.contributor.imecauthorThean, Aaron
dc.contributor.orcidimecRagnarsson, Lars-Ake::0000-0003-1057-8140
dc.contributor.orcidimecChiarella, Thomas::0000-0002-6155-9030
dc.contributor.orcidimecMitard, Jerome::0000-0002-7422-079X
dc.contributor.orcidimecSchram, Tom::0000-0003-1533-7055
dc.contributor.orcidimecHoriguchi, Naoto::0000-0001-5490-0416
dc.source.peerreviewno
dc.source.conference42nd IEEE Semiconductor Interface Specialists Conference - SISC
dc.source.conferencedate1/12/2011
dc.source.conferencelocationArlington, VA USA
imec.availabilityPublished - imec
imec.internalnotes


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