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Fin pitch impact on biaxial/uniaxial strain engineering of triple-gate devices

dc.contributor.authorRodrigues, M.
dc.contributor.authorSonnenberg, V.
dc.contributor.authorMartino, J.A.
dc.contributor.authorCollaert, Nadine
dc.contributor.authorSimoen, Eddy
dc.contributor.authorClaeys, Cor
dc.date.accessioned2021-10-19T18:11:21Z
dc.date.available2021-10-19T18:11:21Z
dc.date.issued2011
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/19694
dc.sourceIIOimport
dc.titleFin pitch impact on biaxial/uniaxial strain engineering of triple-gate devices
dc.typeProceedings paper
dc.contributor.imecauthorCollaert, Nadine
dc.contributor.imecauthorSimoen, Eddy
dc.contributor.orcidimecCollaert, Nadine::0000-0002-8062-3165
dc.contributor.orcidimecSimoen, Eddy::0000-0002-5218-4046
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage151
dc.source.endpage156
dc.source.conferenceAdvanced Semiconductor-on-Insulator Technology and Related Physics 15
dc.source.conferencedate1/05/2011
dc.source.conferencelocationMontreal Canada
imec.availabilityPublished - open access
imec.internalnotesECS Transactions; Vol. 35, Iss. 5


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