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Ultra clean processing technology for highly reliable gate oxides
Publication:
Ultra clean processing technology for highly reliable gate oxides
Date
1994
Proceedings Paper
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189.pdf
945.26 KB
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Heyns, Marc
;
Meuris, Marc
;
Mertens, Paul
;
Schmidt, Harald
;
Verhaverbeke, Steven
;
Bender, Hugo
;
Vandervorst, Wilfried
;
Caymax, Matty
;
Rotondaro, Antonio
;
Hatcher, Z.
;
Gräf, D.
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Abstract
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Citations
Metrics
Views
2098
since deposited on 2021-09-29
430
item.page.metrics.field.last-week
Acq. date: 2025-10-25
Citations