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EUV processing investigation on state-of-the-art coater/developer system

dc.contributor.authorShite, Hideo
dc.contributor.authorBradon, Neil
dc.contributor.authorShimoaoki, T.
dc.contributor.authorKobayashi, S.
dc.contributor.authorNafus, Kathleen
dc.contributor.authorKosugi, Hitoshi
dc.contributor.authorFoubert, Philippe
dc.contributor.authorHermans, Jan
dc.contributor.authorHendrickx, Eric
dc.contributor.authorGoethals, Mieke
dc.contributor.authorGronheid, Roel
dc.contributor.authorJehoul, Christiane
dc.date.accessioned2021-10-19T18:45:48Z
dc.date.available2021-10-19T18:45:48Z
dc.date.issued2011
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/19773
dc.sourceIIOimport
dc.titleEUV processing investigation on state-of-the-art coater/developer system
dc.typeProceedings paper
dc.contributor.imecauthorNafus, Kathleen
dc.contributor.imecauthorFoubert, Philippe
dc.contributor.imecauthorHermans, Jan
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.imecauthorGronheid, Roel
dc.contributor.imecauthorJehoul, Christiane
dc.contributor.orcidimecHermans, Jan::0000-0003-1249-8902
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage796937
dc.source.conferenceExtreme Ultravoiolet (EUV) Lithography II
dc.source.conferencedate27/02/2011
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings SPIE, Vol. 7969


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