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Evaluation of a new advanced low-k material

dc.contributor.authorSmirnov, Evgeny
dc.contributor.authorVanstreels, Kris
dc.contributor.authorVerdonck, Patrick
dc.contributor.authorCiofi, Ivan
dc.contributor.authorShamiryan, Denis
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorPhillips, Mark
dc.date.accessioned2021-10-19T19:02:37Z
dc.date.available2021-10-19T19:02:37Z
dc.date.issued2011
dc.identifier.issn0021-4922
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/19808
dc.sourceIIOimport
dc.titleEvaluation of a new advanced low-k material
dc.typeJournal article
dc.contributor.imecauthorVanstreels, Kris
dc.contributor.imecauthorVerdonck, Patrick
dc.contributor.imecauthorCiofi, Ivan
dc.contributor.orcidimecVanstreels, Kris::0000-0002-4420-0966
dc.contributor.orcidimecVerdonck, Patrick::0000-0003-2454-0602
dc.contributor.orcidimecCiofi, Ivan::0000-0003-1374-4116
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage05EB03
dc.source.journalJapanese Journal of Applied Physics
dc.source.volume50
imec.availabilityPublished - open access


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