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The use of in situ electrochemical measurements to predict corrosion issues during barrier CMP of 30 nm structures

dc.contributor.authorTeugels, Lieve
dc.contributor.authorHeylen, Nancy
dc.contributor.authorLeunissen, Peter
dc.date.accessioned2021-10-19T19:35:32Z
dc.date.available2021-10-19T19:35:32Z
dc.date.issued2011-08
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/19878
dc.sourceIIOimport
dc.titleThe use of in situ electrochemical measurements to predict corrosion issues during barrier CMP of 30 nm structures
dc.typeProceedings paper
dc.contributor.imecauthorTeugels, Lieve
dc.contributor.imecauthorHeylen, Nancy
dc.contributor.orcidimecTeugels, Lieve::0000-0002-6613-9414
dc.source.peerreviewyes
dc.source.conference16th International Symposium on Chemical-Mechanical Planarization - CMP
dc.source.conferencedate7/08/2011
dc.source.conferencelocationLake Placid, NY USA
imec.availabilityPublished - imec


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