Simultaneous etching and deposition processes during the etching of silicon with a Cl(2)/O(2)/Ar inductively coupled plasma
dc.contributor.author | Tinck, Stefan | |
dc.contributor.author | Bogaerts, A. | |
dc.contributor.author | Shamiryan, Denis | |
dc.date.accessioned | 2021-10-19T19:41:43Z | |
dc.date.available | 2021-10-19T19:41:43Z | |
dc.date.issued | 2011 | |
dc.identifier.issn | 1612-8850 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/19892 | |
dc.source | IIOimport | |
dc.title | Simultaneous etching and deposition processes during the etching of silicon with a Cl(2)/O(2)/Ar inductively coupled plasma | |
dc.type | Journal article | |
dc.source.peerreview | yes | |
dc.source.beginpage | 490 | |
dc.source.endpage | 499 | |
dc.source.journal | Plasma Processes and Polymers | |
dc.source.issue | 6 | |
dc.source.volume | 8 | |
imec.availability | Published - imec |
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