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Simultaneous etching and deposition processes during the etching of silicon with a Cl(2)/O(2)/Ar inductively coupled plasma
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Authors
Tinck, Stefan
;
Bogaerts, A.
;
Shamiryan, Denis
ISSN
1612-8850
Issue
6
Journal
Plasma Processes and Polymers
Volume
8
Title
Simultaneous etching and deposition processes during the etching of silicon with a Cl(2)/O(2)/Ar inductively coupled plasma
Publication type
Journal article
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