Publication:
Simultaneous etching and deposition processes during the etching of silicon with a Cl(2)/O(2)/Ar inductively coupled plasma
Date
| dc.contributor.author | Tinck, Stefan | |
| dc.contributor.author | Bogaerts, A. | |
| dc.contributor.author | Shamiryan, Denis | |
| dc.date.accessioned | 2021-10-19T19:41:43Z | |
| dc.date.available | 2021-10-19T19:41:43Z | |
| dc.date.issued | 2011 | |
| dc.identifier.issn | 1612-8850 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/19892 | |
| dc.source.beginpage | 490 | |
| dc.source.endpage | 499 | |
| dc.source.issue | 6 | |
| dc.source.journal | Plasma Processes and Polymers | |
| dc.source.volume | 8 | |
| dc.title | Simultaneous etching and deposition processes during the etching of silicon with a Cl(2)/O(2)/Ar inductively coupled plasma | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
| Files | ||
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