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Removal of high-dose ion-implanted 248nm deep UV photoresist using UV irradiation and organic solvent

dc.contributor.authorTsvetanova, Diana
dc.contributor.authorVos, Rita
dc.contributor.authorVanstreels, Kris
dc.contributor.authorRadisic, Dunja
dc.contributor.authorSonnemans, Roger
dc.contributor.authorBerry, Ivan
dc.contributor.authorWaldfried, Carlo
dc.contributor.authorMattson, David
dc.contributor.authorDeLuca, James
dc.contributor.authorVereecke, Guy
dc.contributor.authorMertens, Paul
dc.contributor.authorParac-Vogt, Tatjana
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-10-19T19:56:44Z
dc.date.available2021-10-19T19:56:44Z
dc.date.issued2011
dc.identifier.issn0013-4651
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/19922
dc.sourceIIOimport
dc.titleRemoval of high-dose ion-implanted 248nm deep UV photoresist using UV irradiation and organic solvent
dc.typeJournal article
dc.contributor.imecauthorTsvetanova, Diana
dc.contributor.imecauthorVos, Rita
dc.contributor.imecauthorVanstreels, Kris
dc.contributor.imecauthorRadisic, Dunja
dc.contributor.imecauthorVereecke, Guy
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecVanstreels, Kris::0000-0002-4420-0966
dc.contributor.orcidimecVereecke, Guy::0000-0001-9058-9338
dc.source.peerreviewyes
dc.source.beginpageH150
dc.source.endpageH155
dc.source.journalJournal of the Electrochemical Society
dc.source.issue2
dc.source.volume158
imec.availabilityPublished - imec


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