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Stochastic limitations for EUV resist kinetics towards the 16nm node

dc.contributor.authorVaglio Pret, Alessandro
dc.contributor.authorGaridis, Kostas
dc.contributor.authorGronheid, Roel
dc.contributor.authorBiafore, John
dc.date.accessioned2021-10-19T20:01:20Z
dc.date.available2021-10-19T20:01:20Z
dc.date.issued2011
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/19931
dc.sourceIIOimport
dc.titleStochastic limitations for EUV resist kinetics towards the 16nm node
dc.typeProceedings paper
dc.contributor.imecauthorVaglio Pret, Alessandro
dc.contributor.imecauthorGronheid, Roel
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conferenceInternational Symposium on Extreme Ultraviolet Lithography - EUVL
dc.source.conferencedate17/10/2011
dc.source.conferencelocationMiami, FL USA
imec.availabilityPublished - open access
imec.internalnotese-proceedings on sematech website


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