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Articles
Mask absorber roughness impact in extreme ultraviolet lithography
Publication:
Mask absorber roughness impact in extreme ultraviolet lithography
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Date
2011
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Vaglio Pret, Alessandro
;
Gronheid, Roel
;
Graves, Trey
;
Smith, Mark D.
;
Biafore, John
Journal
Journal of Micro/Nanolithography MEMS and MOEMS
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1909
since deposited on 2021-10-19
Acq. date: 2025-12-12
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Views
1909
since deposited on 2021-10-19
Acq. date: 2025-12-12
Citations