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Mask absorber roughness impact in extreme ultraviolet lithography

dc.contributor.authorVaglio Pret, Alessandro
dc.contributor.authorGronheid, Roel
dc.contributor.authorGraves, Trey
dc.contributor.authorSmith, Mark D.
dc.contributor.authorBiafore, John
dc.date.accessioned2021-10-19T20:02:41Z
dc.date.available2021-10-19T20:02:41Z
dc.date.issued2011
dc.identifier.issn1537-1646
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/19934
dc.sourceIIOimport
dc.titleMask absorber roughness impact in extreme ultraviolet lithography
dc.typeJournal article
dc.contributor.imecauthorVaglio Pret, Alessandro
dc.contributor.imecauthorGronheid, Roel
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage23012
dc.source.journalJournal of Micro/Nanolithography MEMS and MOEMS
dc.source.issue2
dc.source.volume10
imec.availabilityPublished - open access


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