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Pellicle contribution to optical proximity and critical dimension uniformity for 1.35 numerical aperture immersion ArF lithography

dc.contributor.authorVan Look, Lieve
dc.contributor.authorBekaert, Joost
dc.contributor.authorLaenens, Bart
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorRichter, Jan
dc.contributor.authorBubke, Karsten
dc.contributor.authorPeters, Jan Hendrik
dc.contributor.authorSchreel, Koen
dc.contributor.authorDusa, Mircea
dc.date.accessioned2021-10-19T20:27:13Z
dc.date.available2021-10-19T20:27:13Z
dc.date.issued2011-03
dc.identifier.issn1537-1646
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/19986
dc.sourceIIOimport
dc.titlePellicle contribution to optical proximity and critical dimension uniformity for 1.35 numerical aperture immersion ArF lithography
dc.typeJournal article
dc.contributor.imecauthorVan Look, Lieve
dc.contributor.imecauthorBekaert, Joost
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.imecauthorDusa, Mircea
dc.contributor.orcidimecBekaert, Joost::0000-0003-3075-3479
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage13009
dc.source.journalJournal of Micro/Nanolithography MEMS and MOEMS
dc.source.issue1
dc.source.volume10
imec.availabilityPublished - open access


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