Authors

Van Look, Lieve; Bekaert, Joost; Laenens, Bart; Vandenberghe, Geert; Richter, Jan; Bubke, Karsten; Peters, Jan Hendrik; Schreel, Koen; Dusa, Mircea

ISSN

1537-1646

Issue

1

Journal

Journal of Micro/Nanolithography MEMS and MOEMS

Volume

10

Title

Pellicle contribution to optical proximity and critical dimension uniformity for 1.35 numerical aperture immersion ArF lithography

Publication type

Journal article

Embargo date

9999-12-31