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Pellicle contribution to optical proximity and critical dimension uniformity for 1.35 numerical aperture immersion ArF lithography
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Pellicle contribution to optical proximity and critical dimension uniformity for 1.35 numerical aperture immersion ArF lithography
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Date
2011-03
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Van Look, Lieve
;
Bekaert, Joost
;
Laenens, Bart
;
Vandenberghe, Geert
;
Richter, Jan
;
Bubke, Karsten
;
Peters, Jan Hendrik
;
Schreel, Koen
;
Dusa, Mircea
Journal
Journal of Micro/Nanolithography MEMS and MOEMS
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1924
since deposited on 2021-10-19
Acq. date: 2025-12-11
Citations
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Views
1924
since deposited on 2021-10-19
Acq. date: 2025-12-11
Citations