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Zero-energy SIMS depth profiling: the role of surface roughness development with XeF2 based etching

dc.contributor.authorVanhove, Nico
dc.contributor.authorLievens, Peter
dc.contributor.authorVandervorst, Wilfried
dc.date.accessioned2021-10-19T20:50:49Z
dc.date.available2021-10-19T20:50:49Z
dc.date.issued2011
dc.identifier.issn0142-2421
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/20037
dc.sourceIIOimport
dc.titleZero-energy SIMS depth profiling: the role of surface roughness development with XeF2 based etching
dc.typeJournal article
dc.contributor.imecauthorVandervorst, Wilfried
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage159
dc.source.endpage162
dc.source.journalSurface and Interface Analysis
dc.source.issue1_2
dc.source.volume43
imec.availabilityPublished - open access


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