Zero-energy SIMS depth profiling: the role of surface roughness development with XeF2 based etching
dc.contributor.author | Vanhove, Nico | |
dc.contributor.author | Lievens, Peter | |
dc.contributor.author | Vandervorst, Wilfried | |
dc.date.accessioned | 2021-10-19T20:50:49Z | |
dc.date.available | 2021-10-19T20:50:49Z | |
dc.date.issued | 2011 | |
dc.identifier.issn | 0142-2421 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/20037 | |
dc.source | IIOimport | |
dc.title | Zero-energy SIMS depth profiling: the role of surface roughness development with XeF2 based etching | |
dc.type | Journal article | |
dc.contributor.imecauthor | Vandervorst, Wilfried | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 159 | |
dc.source.endpage | 162 | |
dc.source.journal | Surface and Interface Analysis | |
dc.source.issue | 1_2 | |
dc.source.volume | 43 | |
imec.availability | Published - open access |