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The influence of N containing plasmas on low-k films

dc.contributor.authorVerdonck, Patrick
dc.contributor.authorAresti, Maitane
dc.contributor.authorFerchichi, Abdelkarim
dc.contributor.authorVan Besien, Els
dc.contributor.authorStafford, Ben
dc.contributor.authorTrompoukis, Christos
dc.contributor.authorDe Roest, David
dc.contributor.authorBaklanov, Mikhaïl
dc.date.accessioned2021-10-19T20:57:29Z
dc.date.available2021-10-19T20:57:29Z
dc.date.issued2011
dc.identifier.issn0167-9317
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/20050
dc.sourceIIOimport
dc.titleThe influence of N containing plasmas on low-k films
dc.typeJournal article
dc.contributor.imecauthorVerdonck, Patrick
dc.contributor.imecauthorVan Besien, Els
dc.contributor.imecauthorDe Roest, David
dc.contributor.orcidimecVerdonck, Patrick::0000-0003-2454-0602
dc.contributor.orcidimecVan Besien, Els::0000-0002-5174-2229
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage627
dc.source.endpage630
dc.source.journalMicroelectronic Engineering
dc.source.issue5
dc.source.volume88
imec.availabilityPublished - open access


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