Characterization of modification of 193-nm photoresist by HBr plasma

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Authors
Vereecke, Guy; Claes, Martine; Le, Quoc Toan; Kesters, Els; Struyf, Herbert; Carleer, Robert; Adriaensens, Peter
Conference
4th International Workshop on Plasma Etch and Strip in Microelectronics - PESM
Title
Characterization of modification of 193-nm photoresist by HBr plasma
Publication type
Meeting abstract
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