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Damage in nickel silicides during FIB specimen preparation

dc.contributor.authorVerleysen, Eveline
dc.contributor.authorBender, Hugo
dc.contributor.authorFavia, Paola
dc.contributor.authorSchryvers, Dominique
dc.contributor.authorVandervorst, Wilfried
dc.date.accessioned2021-10-19T21:06:09Z
dc.date.available2021-10-19T21:06:09Z
dc.date.issued2011
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/20067
dc.sourceIIOimport
dc.titleDamage in nickel silicides during FIB specimen preparation
dc.typeMeeting abstract
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorFavia, Paola
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.orcidimecFavia, Paola::0000-0002-1019-3497
dc.source.peerreviewno
dc.source.conferenceMicroscopy of Semiconducting Materials - MSM XVII
dc.source.conferencedate4/04/2011
dc.source.conferencelocationCambridge UK
imec.availabilityPublished - imec


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