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Interplay of plasma etch, strip and wet clean in patterning La2O3/HfO2-containing high-k metal gate stacks
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Acq. date: 2025-12-17
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Acq. date: 2025-12-17
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1 since deposited on 2021-10-19
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1952 since deposited on 2021-10-19
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Acq. date: 2025-12-17
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