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Interplay of plasma etch, strip and wet clean in patterning La2O3/HfO2-containing high-k metal gate stacks
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Authors
Vos, Ingrid
;
Hellin, David
;
Boullart, Werner
;
Vertommen, Johan
ISSN
0167-9317
Issue
1
Journal
Microelectronic Engineering
Volume
88
Title
Interplay of plasma etch, strip and wet clean in patterning La2O3/HfO2-containing high-k metal gate stacks
Publication type
Journal article
Embargo date
9999-12-31
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