dc.contributor.author | Vos, Ingrid | |
dc.contributor.author | Hellin, David | |
dc.contributor.author | Boullart, Werner | |
dc.contributor.author | Vertommen, Johan | |
dc.date.accessioned | 2021-10-19T21:33:01Z | |
dc.date.available | 2021-10-19T21:33:01Z | |
dc.date.issued | 2011 | |
dc.identifier.issn | 0167-9317 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/20118 | |
dc.source | IIOimport | |
dc.title | Interplay of plasma etch, strip and wet clean in patterning La2O3/HfO2-containing high-k metal gate stacks | |
dc.type | Journal article | |
dc.contributor.imecauthor | Vos, Ingrid | |
dc.contributor.imecauthor | Hellin, David | |
dc.contributor.imecauthor | Boullart, Werner | |
dc.contributor.imecauthor | Vertommen, Johan | |
dc.contributor.orcidimec | Boullart, Werner::0000-0001-7614-2097 | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 21 | |
dc.source.endpage | 27 | |
dc.source.journal | Microelectronic Engineering | |
dc.source.issue | 1 | |
dc.source.volume | 88 | |
imec.availability | Published - open access | |