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Preserving printed wafer CD stability in high-frequency EUVL mask cleaning

dc.contributor.authorWähler, Tobias
dc.contributor.authorSingh, Sherjang
dc.contributor.authorDietze, Uwe
dc.contributor.authorJonckheere, Rik
dc.contributor.authorRonse, Kurt
dc.contributor.authorBaudemprez, Bart
dc.date.accessioned2021-10-19T21:35:50Z
dc.date.available2021-10-19T21:35:50Z
dc.date.issued2011
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/20124
dc.sourceIIOimport
dc.titlePreserving printed wafer CD stability in high-frequency EUVL mask cleaning
dc.typeProceedings paper
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.imecauthorRonse, Kurt
dc.contributor.imecauthorBaudemprez, Bart
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conferenceInternational Symposium on Extreme Ultraviolet Lithography - EUVL
dc.source.conferencedate17/10/2011
dc.source.conferencelocationMiami (FL) USA
imec.availabilityPublished - open access
imec.internalnotese-proceedings on Sematech website


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