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Influence of process parameters on low current resistive switching in MOCVD and ALD NiO Films
Publication:
Influence of process parameters on low current resistive switching in MOCVD and ALD NiO Films
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Date
2011
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Wang, Xin Peng
;
Wouters, Dirk
;
Toeller, Michael
;
Meersschaut, Johan
;
Goux, Ludovic
;
Chen, Yangyin
;
Govoreanu, Bogdan
;
Pantisano, Luigi
;
Degraeve, Robin
;
Jurczak, Gosia
;
Altimime, Laith
;
Kittl, Jorge
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1886
since deposited on 2021-10-19
Acq. date: 2026-01-09
Citations
Metrics
Views
1886
since deposited on 2021-10-19
Acq. date: 2026-01-09
Citations