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Influence of process parameters on low current resistive switching in MOCVD and ALD NiO Films
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Authors
Wang, Xin Peng
;
Wouters, Dirk
;
Toeller, Michael
;
Meersschaut, Johan
;
Goux, Ludovic
;
Chen, Yangyin
;
Govoreanu, Bogdan
;
Pantisano, Luigi
;
Degraeve, Robin
;
Jurczak, Gosia
;
Altimime, Laith
;
Kittl, Jorge
Conference
New Functional Materials and Emerging Device Architectures for Nonvolatile Memories
Title
Influence of process parameters on low current resistive switching in MOCVD and ALD NiO Films
Publication type
Proceedings paper
Embargo date
9999-12-31
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