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Built-in self-limitation of masked aluminum anodization using photoresist

dc.contributor.authorZekry, Joseph
dc.contributor.authorCelis, Jean-Pierre
dc.contributor.authorSabuncuoglu Tezcan, Deniz
dc.contributor.authorPuers, Bob
dc.contributor.authorVan Hoof, Chris
dc.contributor.authorTilmans, Harrie
dc.date.accessioned2021-10-19T22:11:40Z
dc.date.available2021-10-19T22:11:40Z
dc.date.issued2011
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/20192
dc.sourceIIOimport
dc.titleBuilt-in self-limitation of masked aluminum anodization using photoresist
dc.typeProceedings paper
dc.contributor.imecauthorSabuncuoglu Tezcan, Deniz
dc.contributor.imecauthorPuers, Bob
dc.contributor.imecauthorVan Hoof, Chris
dc.contributor.imecauthorTilmans, Harrie
dc.contributor.orcidimecSabuncuoglu Tezcan, Deniz::0000-0002-9237-7862
dc.contributor.orcidimecTilmans, Harrie::0000-0003-4240-4962
dc.source.peerreviewno
dc.source.beginpage1633
dc.source.endpage1636
dc.source.conferenceEurosensors XXV
dc.source.conferencedate4/09/2011
dc.source.conferencelocationAthens Greece
imec.availabilityPublished - imec
imec.internalnotesProcedia Engineering; Vol. 25


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