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Characterization of chemically vapor deposited manganese barrier layers using X-ray absorption fine structure

dc.contributor.authorAblett, James
dc.contributor.authorWilson, Chris
dc.contributor.authorPhuong, Nguyen Mai
dc.contributor.authorKoike, Junichi
dc.contributor.authorTokei, Zsolt
dc.contributor.authorSterbinsky, George
dc.contributor.authorWoicik, Joseph
dc.date.accessioned2021-10-20T10:00:47Z
dc.date.available2021-10-20T10:00:47Z
dc.date.issued2012
dc.identifier.issn0021-4922
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/20251
dc.sourceIIOimport
dc.titleCharacterization of chemically vapor deposited manganese barrier layers using X-ray absorption fine structure
dc.typeJournal article
dc.contributor.imecauthorWilson, Chris
dc.contributor.imecauthorTokei, Zsolt
dc.source.peerreviewyes
dc.source.beginpage05EB01
dc.source.journalJapanese Journal of Applied Physics
dc.source.issue5
dc.source.volume51
dc.identifier.urlhttp://jjap.jsap.jp/link?JJAP/51/05EB01/
imec.availabilityPublished - imec


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