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Atomic layer deposition of tantalum oxide and tantalum silicate from chloride precursors

dc.contributor.authorAdelmann, Christoph
dc.contributor.authorDelabie, Annelies
dc.contributor.authorSchepers, Bart
dc.contributor.authorRodriguez, Leonard
dc.contributor.authorFranquet, Alexis
dc.contributor.authorConard, Thierry
dc.contributor.authorOpsomer, Karl
dc.contributor.authorVaesen, Inge
dc.contributor.authorMoussa, Alain
dc.contributor.authorPourtois, Geoffrey
dc.contributor.authorPierloot, Christine
dc.contributor.authorCaymax, Matty
dc.contributor.authorVan Elshocht, Sven
dc.date.accessioned2021-10-20T10:00:51Z
dc.date.available2021-10-20T10:00:51Z
dc.date.issued2012
dc.identifier.issn0948-1907
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/20255
dc.sourceIIOimport
dc.titleAtomic layer deposition of tantalum oxide and tantalum silicate from chloride precursors
dc.typeJournal article
dc.contributor.imecauthorAdelmann, Christoph
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorFranquet, Alexis
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorOpsomer, Karl
dc.contributor.imecauthorVaesen, Inge
dc.contributor.imecauthorMoussa, Alain
dc.contributor.imecauthorPourtois, Geoffrey
dc.contributor.imecauthorPierloot, Christine
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.orcidimecAdelmann, Christoph::0000-0002-4831-3159
dc.contributor.orcidimecFranquet, Alexis::0000-0002-7371-8852
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecPourtois, Geoffrey::0000-0003-2597-8534
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.source.peerreviewyes
dc.source.beginpage225
dc.source.endpage238
dc.source.journalChemical Vapor Deposition
dc.source.issue7_9
dc.source.volume18
imec.availabilityPublished - imec


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