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Poly-Si thin films on graphite substrates by rapid thermal chemical vapor deposition for photovoltaic application

dc.contributor.authorMonna, R.
dc.contributor.authorAngermeier, D.
dc.contributor.authorSlaoui, A.
dc.contributor.authorMuller, J. C.
dc.contributor.authorBeaucarne, Guy
dc.contributor.authorPoortmans, Jef
dc.contributor.authorHebling, C.
dc.date.accessioned2021-09-30T09:18:55Z
dc.date.available2021-09-30T09:18:55Z
dc.date.issued1997
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/2032
dc.sourceIIOimport
dc.titlePoly-Si thin films on graphite substrates by rapid thermal chemical vapor deposition for photovoltaic application
dc.typeProceedings paper
dc.contributor.imecauthorPoortmans, Jef
dc.contributor.orcidimecPoortmans, Jef::0000-0003-2077-2545
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage1456
dc.source.endpage1459
dc.source.conference14th European Photovoltaic Solar Energy Conference and Exhibition. Proceedings of the International Conference
dc.source.conferencedate30/06/1997
dc.source.conferencelocationBarcelona Spain
imec.availabilityPublished - open access


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