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Dynamics of the defects left by a residual droplet on photoresist-coated substrates

dc.contributor.authorBelmiloud, Naser
dc.contributor.authorTamaddon, Amir-Hossein
dc.contributor.authorMertens, Paul
dc.contributor.authorStruyf, Herbert
dc.date.accessioned2021-10-20T10:04:57Z
dc.date.available2021-10-20T10:04:57Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/20347
dc.sourceIIOimport
dc.titleDynamics of the defects left by a residual droplet on photoresist-coated substrates
dc.typeMeeting abstract
dc.contributor.imecauthorTamaddon, Amir-Hossein
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorStruyf, Herbert
dc.contributor.orcidimecTamaddon, Amir-Hossein::0000-0003-4566-0697
dc.source.peerreviewyes
dc.source.conferenceSematech Surface Preparation and Cleaning Conference - SPCC
dc.source.conferencedate19/03/2012
dc.source.conferencelocationAustin, TX USA
imec.availabilityPublished - imec


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