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Cu/lowK interconnects: challenges of plasma processing

dc.contributor.authorBraginsky, O
dc.contributor.authorRakhimov, A
dc.contributor.authorBaklanov, Mikhaïl
dc.date.accessioned2021-10-20T10:08:20Z
dc.date.available2021-10-20T10:08:20Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/20386
dc.sourceIIOimport
dc.titleCu/lowK interconnects: challenges of plasma processing
dc.typeOral presentation
dc.source.peerreviewno
dc.source.conferenceSemicon Russia: EU-RU.NET Workshop
dc.source.conferencedate15/05/2012
dc.source.conferencelocationMoscow Russia
imec.availabilityPublished - imec


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