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Inter-gate dielectric engineering in hybrid floating gate stacks for NAND Flash

dc.contributor.authorBreuil, Laurent
dc.contributor.authorLisoni, Judit
dc.contributor.authorBlomme, Pieter
dc.contributor.authorKar, Gouri Sankar
dc.contributor.authorVan den Bosch, Geert
dc.contributor.authorVan Houdt, Jan
dc.date.accessioned2021-10-20T10:08:57Z
dc.date.available2021-10-20T10:08:57Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/20392
dc.sourceIIOimport
dc.titleInter-gate dielectric engineering in hybrid floating gate stacks for NAND Flash
dc.typeOral presentation
dc.contributor.imecauthorBreuil, Laurent
dc.contributor.imecauthorBlomme, Pieter
dc.contributor.imecauthorKar, Gouri Sankar
dc.contributor.imecauthorVan den Bosch, Geert
dc.contributor.imecauthorVan Houdt, Jan
dc.contributor.orcidimecBreuil, Laurent::0000-0003-2869-1651
dc.contributor.orcidimecVan den Bosch, Geert::0000-0001-9971-6954
dc.contributor.orcidimecVan Houdt, Jan::0000-0003-1381-6925
dc.source.peerreviewno
dc.source.conference43rd IEEE Semiconductor Interface Specialists Conference - SISC
dc.source.conferencedate5/12/2012
dc.source.conferencelocationSan Diego, CA USA
imec.availabilityPublished - imec


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