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High resolution depth profile analysis of ultra-thin STO/TiN layers on Si by LEIS

dc.contributor.authorBrongersma, Hidde
dc.contributor.authorBauer, Peter
dc.contributor.authorBrüner, Philipp
dc.contributor.authorGrehl, Thomas
dc.contributor.authorVan den Berg, Jaap
dc.contributor.authorAdelmann, Christoph
dc.date.accessioned2021-10-20T10:09:09Z
dc.date.available2021-10-20T10:09:09Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/20394
dc.sourceIIOimport
dc.titleHigh resolution depth profile analysis of ultra-thin STO/TiN layers on Si by LEIS
dc.typeOral presentation
dc.contributor.imecauthorAdelmann, Christoph
dc.contributor.orcidimecAdelmann, Christoph::0000-0002-4831-3159
dc.source.peerreviewno
dc.source.conference25th International Conference on Atomic Collisions in Solids
dc.source.conferencedate21/10/2012
dc.source.conferencelocationKyoto Japan
imec.availabilityPublished - imec


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