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Effect of film thickness variation on (100)-surface texturing of MPS processed polycrystalline Si films

dc.contributor.authorChahal, Monica
dc.contributor.authorvan der Wilt, Paul C.
dc.contributor.authorVan Gestel, Dries
dc.contributor.authorLimanov, A.B.
dc.contributor.authorChitu, Adrian M.
dc.contributor.authorIm, James S.
dc.date.accessioned2021-10-20T10:13:23Z
dc.date.available2021-10-20T10:13:23Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/20431
dc.sourceIIOimport
dc.titleEffect of film thickness variation on (100)-surface texturing of MPS processed polycrystalline Si films
dc.typeProceedings paper
dc.source.peerreviewyes
dc.source.beginpage257
dc.source.endpage262
dc.source.conferenceAmorphous and Polycrystalline Thin-Film Silicon Science and Technology
dc.source.conferencedate9/04/2012
dc.source.conferencelocationSan Francisco, CA USA
dc.identifier.urlhttp://dx.doi.org/10.1557/opl.2012.1400
imec.availabilityPublished - imec
imec.internalnotesMRS Symposium proceedings; Vol. 1426


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