dc.contributor.author | Cramer, H. | |
dc.contributor.author | Chen, An | |
dc.contributor.author | Li, Frank | |
dc.contributor.author | Leray, Philippe | |
dc.contributor.author | Charley, Anne-Laure | |
dc.contributor.author | Van Look, Lieve | |
dc.contributor.author | Bekaert, Joost | |
dc.contributor.author | Cheng, Shaunee | |
dc.date.accessioned | 2021-10-20T10:24:38Z | |
dc.date.available | 2021-10-20T10:24:38Z | |
dc.date.issued | 2012 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/20505 | |
dc.source | IIOimport | |
dc.title | High-speed full 3D feature metrology for litho monitoring, matching and model calibration with scatterometry | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Leray, Philippe | |
dc.contributor.imecauthor | Charley, Anne-Laure | |
dc.contributor.imecauthor | Van Look, Lieve | |
dc.contributor.imecauthor | Bekaert, Joost | |
dc.contributor.orcidimec | Bekaert, Joost::0000-0003-3075-3479 | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 83240R | |
dc.source.conference | Metrology, Inspection, and Process Control for Microlithography XXVI | |
dc.source.conferencedate | 12/02/2012 | |
dc.source.conferencelocation | San Jose, CA USA | |
imec.availability | Published - open access | |
imec.internalnotes | Proceedings of SPIE; Vol. 8324 | |