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Impact of an etched EUV mask black border on imaging and overlay

dc.contributor.authorDavydova, N.
dc.contributor.authorde kruif, R.
dc.contributor.authorFukugami, N.
dc.contributor.authorKondo, S.
dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorVan Setten, E.
dc.contributor.authorConnolly, B.
dc.contributor.authorLammers, A.
dc.contributor.authorVaenkatesan, V.
dc.contributor.authorZimmerman, J.
dc.contributor.authorHarned, N.
dc.date.accessioned2021-10-20T10:28:09Z
dc.date.available2021-10-20T10:28:09Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/20525
dc.sourceIIOimport
dc.titleImpact of an etched EUV mask black border on imaging and overlay
dc.typeProceedings paper
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.source.peerreviewyes
dc.source.beginpage852206
dc.source.conferencePhotomask Technology
dc.source.conferencedate10/09/2012
dc.source.conferencelocationMonterey, CA USA
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 8522


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