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Impact of an etched EUV mask black border on imaging and overlay

dc.contributor.authorde Kruif, Rob
dc.contributor.authorDavydova, Natalia
dc.contributor.authorConnolly, Brid
dc.contributor.authorFukugami, Norihito
dc.contributor.authorLammers, Ad
dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorKondo, Shinpei
dc.contributor.authorVan Setten, Eelco
dc.contributor.authorVaenkatesan, Vidya
dc.contributor.authorZimmerman, John
dc.contributor.authorHarned, Noreen
dc.date.accessioned2021-10-20T10:32:02Z
dc.date.available2021-10-20T10:32:02Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/20547
dc.sourceIIOimport
dc.titleImpact of an etched EUV mask black border on imaging and overlay
dc.typeOral presentation
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.source.peerreviewno
dc.source.conferenceInternational Symposium on Extreme Ultraviolet Lithography - EUVL
dc.source.conferencedate1/10/2012
dc.source.conferencelocationBrussels Belgium
dc.identifier.urlhttps://www.sematech.org/10258
imec.availabilityPublished - imec


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