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Modeling and tuning the filament properties in RRAM metal oxide stacks for optimized stable cycling

dc.contributor.authorDegraeve, Robin
dc.contributor.authorGoux, Ludovic
dc.contributor.authorClima, Sergiu
dc.contributor.authorGovoreanu, Bogdan
dc.contributor.authorChen, Yangyin
dc.contributor.authorKar, Gouri Sankar
dc.contributor.authorRoussel, Philippe
dc.contributor.authorPourtois, Geoffrey
dc.contributor.authorWouters, Dirk
dc.contributor.authorAltimime, Laith
dc.contributor.authorJurczak, Gosia
dc.contributor.authorGroeseneken, Guido
dc.contributor.authorKittl, Jorge
dc.date.accessioned2021-10-20T10:38:00Z
dc.date.available2021-10-20T10:38:00Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/20579
dc.sourceIIOimport
dc.titleModeling and tuning the filament properties in RRAM metal oxide stacks for optimized stable cycling
dc.typeProceedings paper
dc.contributor.imecauthorDegraeve, Robin
dc.contributor.imecauthorGoux, Ludovic
dc.contributor.imecauthorClima, Sergiu
dc.contributor.imecauthorGovoreanu, Bogdan
dc.contributor.imecauthorChen, Yangyin
dc.contributor.imecauthorKar, Gouri Sankar
dc.contributor.imecauthorRoussel, Philippe
dc.contributor.imecauthorPourtois, Geoffrey
dc.contributor.imecauthorJurczak, Gosia
dc.contributor.imecauthorGroeseneken, Guido
dc.contributor.orcidimecGoux, Ludovic::0000-0002-1276-2278
dc.contributor.orcidimecClima, Sergiu::0000-0002-4044-9975
dc.contributor.orcidimecRoussel, Philippe::0000-0002-0402-8225
dc.contributor.orcidimecPourtois, Geoffrey::0000-0003-2597-8534
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage1
dc.source.endpage2
dc.source.conferenceInternational Symposium on VLSI Technology, Systems, and Applications - VLSI-TSA
dc.source.conferencedate23/04/2012
dc.source.conferencelocationHsinchu Taiwan
dc.identifier.urlhttp://ieeexplore.ieee.org/xpl/articleDetails.jsp?arnumber=6210101
imec.availabilityPublished - open access


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