Show simple item record

Influence of boron diffusion on ultra-thin oxides

dc.contributor.authorNigam, Tanya
dc.contributor.authorDepas, Michel
dc.contributor.authorHeyns, Marc
dc.contributor.authorSofield, C. F.
dc.contributor.authorMapeldoram, L.
dc.date.accessioned2021-09-30T09:21:01Z
dc.date.available2021-09-30T09:21:01Z
dc.date.issued1997
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/2057
dc.sourceIIOimport
dc.titleInfluence of boron diffusion on ultra-thin oxides
dc.typeProceedings paper
dc.contributor.imecauthorHeyns, Marc
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage101
dc.source.endpage106
dc.source.conferenceMaterials Reliability in Microelectronics VII
dc.source.conferencedate31/03/1997
dc.source.conferencelocationSan Francisco, CA USA
imec.availabilityPublished - open access
imec.internalnotesMRS Symposium Proceedings; Vol. 473


Files in this item

Thumbnail
Name:
2030.pdf
Size:
250.7Kb
Format:
PDF
View/open

This item appears in the following collection(s)

Show simple item record