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Exchange bias induced by O ion implantation in ferromagnetic thin films

dc.contributor.authorDemeter, J.
dc.contributor.authorMenendez, E.
dc.contributor.authorSchrauwen, A.
dc.contributor.authorTeichert, A.
dc.contributor.authorSteitz, R.
dc.contributor.authorVandezande, S.
dc.contributor.authorWildes, A. R.
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorTemst, K.
dc.contributor.authorVantomme, Andre
dc.date.accessioned2021-10-20T10:38:51Z
dc.date.available2021-10-20T10:38:51Z
dc.date.issued2012
dc.identifier.issn0022-3727
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/20583
dc.sourceIIOimport
dc.titleExchange bias induced by O ion implantation in ferromagnetic thin films
dc.typeJournal article
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorVantomme, Andre
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage405004
dc.source.journalJournal of Physics D: Applied Physics
dc.source.issue40
dc.source.volume45
imec.availabilityPublished - open access


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