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In situ monitoring of atomic layer deposition in nanoporous thin films using ellipsometric porosimetry

dc.contributor.authorDendooven, Jolien
dc.contributor.authorDevloo-Casier, Kilian
dc.contributor.authorLevrau, Elisabeth
dc.contributor.authorVan Hove, Robbert
dc.contributor.authorPulinthanathu Sree, Sreeprasanth
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorMartens, Johan
dc.contributor.authorDetavernier, Christophe
dc.date.accessioned2021-10-20T10:39:16Z
dc.date.available2021-10-20T10:39:16Z
dc.date.issued2012
dc.identifier.issn0743-7463
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/20585
dc.sourceIIOimport
dc.titleIn situ monitoring of atomic layer deposition in nanoporous thin films using ellipsometric porosimetry
dc.typeJournal article
dc.contributor.imecauthorLevrau, Elisabeth
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage3852
dc.source.endpage3859
dc.source.journalLangmuir
dc.source.issue8
dc.source.volume28
imec.availabilityPublished - open access


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