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Rigorous modeling and optimization

dc.contributor.authorErdman, Andreas
dc.contributor.authorEvanschitzky, Peter
dc.contributor.authorBret, Tristan
dc.contributor.authorJonckheere, Rik
dc.date.accessioned2021-10-20T10:55:32Z
dc.date.available2021-10-20T10:55:32Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/20657
dc.sourceIIOimport
dc.titleRigorous modeling and optimization
dc.typeOral presentation
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.source.peerreviewno
dc.source.conferenceInternational Symposium on Extreme Ultraviolet Lithography - EUVL
dc.source.conferencedate1/10/2012
dc.source.conferencelocationBrussels Belgium
dc.identifier.urlwww.sematech.org/10258/
imec.availabilityPublished - imec


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