Rigorous modeling and optimization
dc.contributor.author | Erdman, Andreas | |
dc.contributor.author | Evanschitzky, Peter | |
dc.contributor.author | Bret, Tristan | |
dc.contributor.author | Jonckheere, Rik | |
dc.date.accessioned | 2021-10-20T10:55:32Z | |
dc.date.available | 2021-10-20T10:55:32Z | |
dc.date.issued | 2012 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/20657 | |
dc.source | IIOimport | |
dc.title | Rigorous modeling and optimization | |
dc.type | Oral presentation | |
dc.contributor.imecauthor | Jonckheere, Rik | |
dc.contributor.orcidimec | Jonckheere, Rik::0000-0003-2211-9443 | |
dc.source.peerreview | no | |
dc.source.conference | International Symposium on Extreme Ultraviolet Lithography - EUVL | |
dc.source.conferencedate | 1/10/2012 | |
dc.source.conferencelocation | Brussels Belgium | |
dc.identifier.url | www.sematech.org/10258/ | |
imec.availability | Published - imec |
Files in this item
Files | Size | Format | View |
---|---|---|---|
There are no files associated with this item. |