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Analysis of EUV mask multilayer defect printing characteristics

dc.contributor.authorErdmann, Andreas
dc.contributor.authorEvanschitzky, Peter
dc.contributor.authorBret, Tristan
dc.contributor.authorJonckheere, Rik
dc.date.accessioned2021-10-20T10:55:45Z
dc.date.available2021-10-20T10:55:45Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/20658
dc.sourceIIOimport
dc.titleAnalysis of EUV mask multilayer defect printing characteristics
dc.typeProceedings paper
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage83220E
dc.source.conferenceExtreme Ultraviolet (EUV) Lithography III
dc.source.conferencedate12/02/2012
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings SPIE; Vol. 8322


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