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Development of a dedicated software for the quantification of two-dimensional high vacuum scanning spreading resistance microscopy measurements

dc.contributor.authorEyben, Pierre
dc.contributor.authorClarysse, Trudo
dc.contributor.authorSchulze, Andreas
dc.contributor.authorNazir, Aftab
dc.contributor.authorVandervorst, Wilfried
dc.date.accessioned2021-10-20T10:57:36Z
dc.date.available2021-10-20T10:57:36Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/20666
dc.sourceIIOimport
dc.titleDevelopment of a dedicated software for the quantification of two-dimensional high vacuum scanning spreading resistance microscopy measurements
dc.typeOral presentation
dc.contributor.imecauthorEyben, Pierre
dc.contributor.imecauthorNazir, Aftab
dc.contributor.imecauthorVandervorst, Wilfried
dc.source.peerreviewno
dc.source.conferenceE-MRS Fall Meeting Symposium J: High-Resolution Electrical and Chemical Characterization of Nanometer-Scale Org and Inorg. Dev.
dc.source.conferencedate17/09/2012
dc.source.conferencelocationWarsaw Poland
imec.availabilityPublished - imec


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