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Simulation of the post-implantation anneal for emitter profile optimization in high efficiency c-Si solar cells

dc.contributor.authorFlorakis, Antonios
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorJanssens, Tom
dc.contributor.authorRosseel, Erik
dc.contributor.authorDouhard, Bastien
dc.contributor.authorDelmotte, Joris
dc.contributor.authorCornagliotti, Emanuele
dc.contributor.authorBaert, Kris
dc.contributor.authorPosthuma, Niels
dc.contributor.authorPoortmans, Jef
dc.date.accessioned2021-10-20T11:02:20Z
dc.date.available2021-10-20T11:02:20Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/20685
dc.sourceIIOimport
dc.titleSimulation of the post-implantation anneal for emitter profile optimization in high efficiency c-Si solar cells
dc.typeProceedings paper
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorRosseel, Erik
dc.contributor.imecauthorDouhard, Bastien
dc.contributor.imecauthorCornagliotti, Emanuele
dc.contributor.imecauthorPosthuma, Niels
dc.contributor.imecauthorPoortmans, Jef
dc.contributor.orcidimecPosthuma, Niels::0000-0002-6029-1909
dc.contributor.orcidimecPoortmans, Jef::0000-0003-2077-2545
dc.source.peerreviewyes
dc.source.beginpage206
dc.source.endpage211
dc.source.conferenceIon Implantation Technology. Proceedings of the 19th International Conference
dc.source.conferencedate25/06/2012
dc.source.conferencelocationValladolid Spain
imec.availabilityPublished - imec
imec.internalnotesAIP Conference Proceedings; Vol. 1496


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