dc.contributor.author | Foubert, Philippe | |
dc.contributor.author | Nafus, Kathleen | |
dc.contributor.author | Shite, Hideo | |
dc.contributor.author | Goethals, Mieke | |
dc.contributor.author | Matsunaga, Koichi | |
dc.contributor.author | Hermans, Jan | |
dc.contributor.author | Hendrickx, Eric | |
dc.date.accessioned | 2021-10-20T11:02:36Z | |
dc.date.available | 2021-10-20T11:02:36Z | |
dc.date.issued | 2012 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/20686 | |
dc.source | IIOimport | |
dc.title | Process evaluation and optimization for EUV manufacturing | |
dc.type | Oral presentation | |
dc.contributor.imecauthor | Foubert, Philippe | |
dc.contributor.imecauthor | Nafus, Kathleen | |
dc.contributor.imecauthor | Hermans, Jan | |
dc.contributor.imecauthor | Hendrickx, Eric | |
dc.contributor.orcidimec | Hermans, Jan::0000-0003-1249-8902 | |
dc.source.peerreview | no | |
dc.source.conference | International symposium on Extrem Ultraviolet Lithography - EUVL | |
dc.source.conferencedate | 30/09/2012 | |
dc.source.conferencelocation | Brussels Belgium | |
dc.identifier.url | https://www.sematech.org/10258 | |
imec.availability | Published - imec | |