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Calibration and verification of a stochastic model for EUV resist

dc.contributor.authorGao, Weimin
dc.contributor.authorPhilippou, Alexander
dc.contributor.authorKlostermann, Ulrich
dc.contributor.authorSiebert, Joachim
dc.contributor.authorPhilipsen, Vicky
dc.contributor.authorHendrickx, Eric
dc.contributor.authorVandeweyer, Tom
dc.contributor.authorJonckheere, Rik
dc.date.accessioned2021-10-20T11:07:25Z
dc.date.available2021-10-20T11:07:25Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/20704
dc.sourceIIOimport
dc.titleCalibration and verification of a stochastic model for EUV resist
dc.typeProceedings paper
dc.contributor.imecauthorPhilipsen, Vicky
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.imecauthorVandeweyer, Tom
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.orcidimecPhilipsen, Vicky::0000-0002-2959-432X
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage83221D
dc.source.conferenceExtreme Ultraviolet (EUV) Lithography III
dc.source.conferencedate12/02/2012
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings SPIE; Vol. 8322


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