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Crystalline properties and strain relaxation mechanism of CVD grown GeSn

dc.contributor.authorGencarelli, Federica
dc.contributor.authorVincent, Benjamin
dc.contributor.authorKumar, Arul
dc.contributor.authorDemeulemeester, Jelle
dc.contributor.authorVantomme, Andre
dc.contributor.authorFranquet, Alexis
dc.contributor.authorMeersschaut, Johan
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorLoo, Roger
dc.contributor.authorCaymax, Matty
dc.contributor.authorTemst, Kristiaan
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-10-20T11:10:03Z
dc.date.available2021-10-20T11:10:03Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/20714
dc.sourceIIOimport
dc.titleCrystalline properties and strain relaxation mechanism of CVD grown GeSn
dc.typeMeeting abstract
dc.contributor.imecauthorVincent, Benjamin
dc.contributor.imecauthorVantomme, Andre
dc.contributor.imecauthorFranquet, Alexis
dc.contributor.imecauthorMeersschaut, Johan
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorTemst, Kristiaan
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecFranquet, Alexis::0000-0002-7371-8852
dc.contributor.orcidimecMeersschaut, Johan::0000-0003-2467-1784
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage3213
dc.source.conferenceECS Fall Meeting Symposium: SiGe, Ge, and Related Compounds: Materials, Processing, and Devices
dc.source.conferencedate7/10/2012
dc.source.conferencelocationHonolulu, HI USA
imec.availabilityPublished - open access
imec.internalnotesECS Meeting Abstracts; Vol. MA2012-02


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