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EUV resist process performance investigations on the NXE 3100 full field scanner

dc.contributor.authorGoethals, Mieke
dc.contributor.authorFoubert, Philippe
dc.contributor.authorHosokawa, Kohei
dc.contributor.authorVan Roey, Frieda
dc.contributor.authorNiroomand, Ardavan
dc.contributor.authorVan Den Heuvel, Dieter
dc.contributor.authorPollentier, Ivan
dc.date.accessioned2021-10-20T11:14:09Z
dc.date.available2021-10-20T11:14:09Z
dc.date.issued2012
dc.identifier.issn0914-9244
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/20730
dc.sourceIIOimport
dc.titleEUV resist process performance investigations on the NXE 3100 full field scanner
dc.typeJournal article
dc.contributor.imecauthorFoubert, Philippe
dc.contributor.imecauthorVan Roey, Frieda
dc.contributor.imecauthorVan Den Heuvel, Dieter
dc.contributor.imecauthorPollentier, Ivan
dc.contributor.orcidimecPollentier, Ivan::0000-0002-4266-6500
dc.source.peerreviewyes
dc.source.beginpage559
dc.source.endpage567
dc.source.journalJournal of Photopolymer Science and Technology
dc.source.issue5
dc.source.volume25
imec.availabilityPublished - imec


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