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dc.contributor.authorGoverde, Hans
dc.contributor.authorVermang, Bart
dc.contributor.authorMorato, Alessandro
dc.contributor.authorJohn, Joachim
dc.contributor.authorHorzel, Jörg
dc.contributor.authorMeneghesso, Gaudenzio
dc.contributor.authorPoortmans, Jef
dc.date.accessioned2021-10-20T11:18:29Z
dc.date.available2021-10-20T11:18:29Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/20746
dc.sourceIIOimport
dc.titleAl2O3 surface passivation characterized on hydrophobic and hydrophilic c-Si by a combination of QSSPC, CV, XPS and FTIR
dc.typeProceedings paper
dc.contributor.imecauthorVermang, Bart
dc.contributor.imecauthorJohn, Joachim
dc.contributor.imecauthorPoortmans, Jef
dc.contributor.orcidimecVermang, Bart::0000-0003-2669-2087
dc.contributor.orcidimecPoortmans, Jef::0000-0003-2077-2545
dc.source.peerreviewyes
dc.source.beginpage355
dc.source.endpage360
dc.source.conferenceProceedings of the 2nd International Conference on Crystalline Silicon Photovoltaics - Silicon PV
dc.source.conferencedate3/04/2012
dc.source.conferencelocationLeuven Belgium
dc.identifier.urlhttp://www.sciencedirect.com/science/article/pii/S1876610212012891
imec.availabilityPublished - imec
imec.internalnotesEnergy Procedia; Vol. 27


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