dc.contributor.author | Hendrickx, Eric | |
dc.contributor.author | Hermans, Jan | |
dc.contributor.author | Jonckheere, Rik | |
dc.contributor.author | Van Den Heuvel, Dieter | |
dc.contributor.author | Lorusso, Gian | |
dc.contributor.author | Foubert, Philippe | |
dc.contributor.author | De Bisschop, Peter | |
dc.contributor.author | Vandenberghe, Geert | |
dc.contributor.author | Ronse, Kurt | |
dc.date.accessioned | 2021-10-20T11:33:52Z | |
dc.date.available | 2021-10-20T11:33:52Z | |
dc.date.issued | 2012 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/20800 | |
dc.source | IIOimport | |
dc.title | EUV Lithography in pre-production mode | |
dc.type | Oral presentation | |
dc.contributor.imecauthor | Hendrickx, Eric | |
dc.contributor.imecauthor | Hermans, Jan | |
dc.contributor.imecauthor | Jonckheere, Rik | |
dc.contributor.imecauthor | Van Den Heuvel, Dieter | |
dc.contributor.imecauthor | Lorusso, Gian | |
dc.contributor.imecauthor | Foubert, Philippe | |
dc.contributor.imecauthor | De Bisschop, Peter | |
dc.contributor.imecauthor | Vandenberghe, Geert | |
dc.contributor.imecauthor | Ronse, Kurt | |
dc.contributor.orcidimec | Hermans, Jan::0000-0003-1249-8902 | |
dc.contributor.orcidimec | Jonckheere, Rik::0000-0003-2211-9443 | |
dc.contributor.orcidimec | Ronse, Kurt::0000-0003-0803-4267 | |
dc.source.peerreview | no | |
dc.source.conference | Semicon Japan | |
dc.source.conferencedate | 5/12/2012 | |
dc.source.conferencelocation | Tokyo Japan | |
imec.availability | Published - imec | |